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InLiquid TungstenThinFilmDeposition PinPointMode WS2 pulsed_laser_deposition Carbon cannabinoid SingleCrystal Yttria_stabilized_Zirconia LightEmiting PS_LDPE MfmPhase P3HT CHRYSALIS_INC Magnetic Force Microscopy cannabidiol neodymium_magnets CuSubstrate Annealed Boundary lithography Defect Mapping PhaseImaging MagneticForceMicroscopy Gong DomainSwitching Conductivity Nanofiber amplitude_modulation NUS_NNI_Nanocore optoelectronics Ca10(PO4)6(OH)2 HfO2 FastScan
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Hard defect repair of photomask
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 1.25μm×1.25μm
- Pixel Size : 256×256
- Cantilever : OMCL-AC160TS for imaging, AD-40 AS for repairing (k=42N/m, f=330kHz)