-
EPFL StyreneBeads Trench nanomechanical Wafer hard_disk BlockCopolymer Phenanthrene PhaseTransition FrictionalForceMicroscopy C_AFM FloppyDisk Styrene PANI BiasMode phase_change Layer norganic MoS2 Multiferroic_materials PolyimideFilm dielectric_trench DeoxyribonucleicAcid Nanofiber kelvin probe force microscopy Calcite GaAs ThermalProperties CrystalGrowing Conducting Au111 BiFeO3 Nanostructure hydrocarbon WS2
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Graphene_hBN Moiré Pattern
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: NCHR
- Scan Size: 500nm×500nm,
- Scan Rate: 2Hz, 4Hz
- Pixel: 256 × 256
- Scan Mode: Non-contact
- Cantilever: NCHR
- Scan Size: 500nm×500nm,
- Scan Rate: 2Hz, 4Hz
- Pixel: 256 × 256