-
TyphimuriumBiofilm Thermoplastic_polyurethane Polyethylene DNAProtein Electrode PinpointNanomechanicalMode Genetic SicMosfet Friction NUS Austenite Implant BiFeO3 Pores ReflexLens Pzt Cobalt-dopedIronOxide FailureAnlaysis Pvdf Formamidinium_lead_iodide PVA OrganicSemiconductor CalciumHydroxyapatite Au111 P3HT VinylAlcohol VortexCore HfO2 PFM Treatment Lateral_Force_Microscopy Phosphide Pinpoint UnivMaryland Force-distance
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256