2023 차세대 리소그래피 학술대회가 2023년 8월 21일부터 22일까지 수원컨벤션센터에서 Driving Innovation with Lithography 를 주제로 개최됩니다. 

반도체 리소그래피 기술 관련 전문가들과 소통하고 교류하는 기회가 될 차세대 리소그래피 학술대회에 여러분의 많은 관심과 참가 바랍니다.

▶일정: 2023년 8월 21일(월) - 22일(화)

▶장소: 수원컨벤션센터

Keynote Talk

AFM for Lithography

Dongchun (Richard) Lee
EVP of Product Marketing, Park Systems

Abstract

In recent years, as semiconductor devices have entered sub 20nm design rule era, EUV Lithography has become the key enabler of nano device production. In line with this trend, the need for analytical techniques of sub-nanometer defects in 3D shapes and mechanical and chemical properties is significantly increasing. We have developed defect characterization and defect-repairing techniques using nano-machining and nano-metrology capability of AFM for the EUV photomasks. I’d like to present about the inline Atomic Force Microscope (AFM) technologies to analyze the 3D shape and mechanical and chemical properties of defects on EUV masks and then remove them.

Invited Talk

Nanopatterning on graphene layers by AFM-based nanolithography (Patterning Materials Session)

Seong-Oh (Jake) Kim
Manager of Application Technology Center, Park Systems

Link: https://2023.ngl.or.kr/