-
suspended_graphene Aluminum dichalcogenide graphene_hybrid silicon_carbide ring shape Global_Comm HOPG Force-distance SThM Spincast Bacteria TipBiasMode Materials MLCC electrospinning Boundary temp Polymer NCM DNA SingleLayer mono_layer FrequencyModulation fluoroalkane DeflectionOptics layers Oxidation Bacterium ContactModeDot Mapping Permalloy Lanthanum_aluminate biocompatible temperature_control
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Christmas Ball Lithography on Si
Create oxidation layers on bare Si surface using bias mode of lithography.
Scanning Conditions
- System: NX10
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area
- Scan Mode: Lithography
- Cantilever: AD-40-SS (k=40N/m, f=200kHz)
- Scan Size: 40μm×40μm
- Scan Rate: 0.5Hz
- Pixel Size: 1024 × 1024
- Tip Bias: -10V for patterened area