-
PUR Graphene Optic OxideLayer FloppyDisk Ananth Chloroform UTEM SurfaceChange TungstenThinFilmDeposition MechanicalProperty Platinum ChemicalCompound ScratchMode sputter AM_SKPM AIN ImideMonomer Jason mechanical property DIWafer molecules ring shape Magnets Logo ContactModeDots Liquid Laser Chemical_Vapor_Deposition Granada Conductivity MultiLayerCeramicCapacitor SingleLayer Steps HexagonalBoronNitride
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
LiNbO3 wafer
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC55TS (k=85N/m, f=1600kHz)
- Scan Size:20μm×20μm, 2.5μm×2.5μm
- Scan Rate: 5Hz, 10Hz
- Pixel: 512×512, 256×256
- Scan Mode: Non-contact
- Cantilever: AC55TS (k=85N/m, f=1600kHz)
- Scan Size:20μm×20μm, 2.5μm×2.5μm
- Scan Rate: 5Hz, 10Hz
- Pixel: 512×512, 256×256