-
Alloy flakes ForceVolume mechanical property Reduction SiWafer Conductivity Inorganic Worcester_Polytechnic_Institute Treatment HumanHair Yttria_stabilized_Zirconia YszSubstrate PolycrystallineFerroelectricBCZT Temasek_Lab Polypropylene FM_SKPM CastIron Electrical&Electronics Semiconductor HOPG Sapphire Chromium FM-KPFM Defects Electical&Electronics contact LithiumNiobate SrO Conductive AFM GlassTemp Indium_tin_oxide IMT_Bucharest Ceramics Dopped
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Moire pattern of MoS₂-WSe₂
Scanning Conditions
- System : FX40
- Scan Mode: Tapping
- Scan Rate : 3Hz
- Scan Size : 500nm×500nm
- Pixel Size : 512×512
- Cantilever : PPP-FMR (k=2.8N/m, f=75kHz)