-
Memory DeoxyribonucleicAcid Laser Hexatriacontane Pinpoint PFM Oxide C_AFM SiWafer nanomechanical Plug CuParticle Pores Bismuth HardDisk Mechanical single_layer Permalloy PtfeMembrane MolecularSelfAssembly LeakageCurrent LaAlO3 Step Terrace MultiLayerCeramicCapacitor Ceramics self_healing ScratchMode ElectrostaticForceMicroscopy NusEce 2d_materials LiquidCell graphene_hybrid phase_change Global_Comm Granada
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
MoSi₂ Hard defect repair
Scanning Conditions
- System : NX-Mask
- Scan Mode: Non-contact for imaging Sweep for repairing
- Scan Rate : 0.3 Hz
- Scan Size : 6μm, 0.5μm×1μm
- Pixel Size : 512×64 for 6μm2, 512×34 for 0.5μm×1μm