-
Zagreb FailureAnalysis Tape Hexatriacontane temp semifluorinated_alkanes temp_control Collagen LifeScience StrontiuTitanate Pinpoint Granada VerticalPFM CarbonNanotube Sio2 SAM ThermalConductivity SiliconeOxide chemical_compound Edwin TriGlycineSulphate Solution Display Bmp Au111 CaMnO3 China OrganicCompound LiquidCrystal Barium_titanate SiliconCrystal Praseodymium dielectric trench PetruPoni_Institute Solar
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256