-
Deposition Ito LDPE ConductiveAFM TemperatureControllerAFM Sadowski BiasMode Morphology Semiconductor SSRM H-BN Global_Comm HanyangUniv Au111 DentalProsthesis amplitude_modulation BlockCopolymer PolyvinylideneFluoride Chrome Polyvinylidene atomic_steps PhthalocyaninePraseodymium MeltingPoint PtfeFilter NUS_Physics HighResolution MoirePattern Battery PolyimideFilm Fluoride Butterfly WPlug solar_cell BreastCancerCell NtuEee
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ITO Film Sputter Deposited onto Silicon
ITO-film, which was sputter deposited onto silicon. The grain size of those samples was influenced by changing the process settings in the Cluterline RAD sputter deposition system, one of the deposition tool platforms manufactured by Evatec.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256
- Scan Mode: Non-contact
- Cantilever: PPP-EFM (k=2.8N/m, f=75kHz)
- Scan Size: 5μm×5μm
- Scan Rate: 0.1Hz
- Pixel Size: 256 × 256