-
Wonseok AM-KPFM Self-assembledMonolayer Calcite Pipette SelfAssembly OpticalWaveguides CrystalGrowing VerticalPFM GalliumPhosphide multi_layer LiBattery Polytetrafluoroethylene bias_mode TriGlycineSulphate contact Electical&Electronics TemperatureControl Chemical_Vapor_Deposition Polydimethylsiloxane Adhesive PpLdpe InorganicCompound CrossSection WS2 SiWafer temperature controller AFM PinpointPFM Steps FM_SKPM self_healing Zagreb Hafnium_dioxide UnivMaryland Device
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
HfO2 into Indium Tin Oxide Film
ITO film on 1% HfO2-doped Yttria-stabilized Zirconia (001) orientation grown by pulsed laser deposition. Surface segregation of HfO2 into ITO film.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz))
- Scan Size: 10μm×10μm,5μm×5μm
- Scan Rate: 0.6Hz, 1Hz
- Pixel Size: 256 × 256, 256 x 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz))
- Scan Size: 10μm×10μm,5μm×5μm
- Scan Rate: 0.6Hz, 1Hz
- Pixel Size: 256 × 256, 256 x 256