-
Mechanical Flake BismuthFerrite TungstenDeposition Bmp MultiLayerCeramicCapacitor Optical Defect Hafnium_dioxide PtfeFilter Liquid temperature controller AFM Graphene Terrace TyphimuriumBiofilm Glass Chemical Vapor Deposition Regensburg C36H74 nanobar ThermalProperties norganic CaMnO3 Silicon BariumTitanate BiFeO3 IRDetector Hysteresys ForceMapping Sapphire Semiconductor Blood Electical&Electronics SetpointMode Iron
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Trench Etch Profile on Si Wafer
Top dielectric trench etch profile on Si wafer having tapered slope at the trench sidewall.
Scanning Conditions
- System: NX20
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm
- Scan Rate: 0.21Hz
- Pixel: 1024 × 256