-
Pores Worcester_Polytechnic_Institute Polyimide Morphology Conductive AFM Ram CaMnO3 CalciumHydroxyapatite exfoliate Imprint LateralForce TungstenThinFilmDeposition PS_LDPE temperature controller AFM thermal_property dielectric_trench TungstenDeposition OxideLayer CancerCell MagneticForce semifluorinated_alkanes molecules UTEM Platinum light_emitting light_emission FuelCell FAFailureAnlaysis Phthalocyanine IcelandSpar Floppy Sadowski ForceMapping C_AFM InorganicCompound
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Photoresist pattern (post-development process)
Scanning Conditions
- System : NX-3DM
- Scan Mode: Non-contact
- Scan Rate : 0.1 Hz
- Scan Size : 2μm×10μm
- Pixel Size : 512×2048
- Cantilever : EBD-R2-NCLR (k=45N/m, f=190kHz)