-
semifluorinated_alkanes Boundary ScanningKelvinProbeMicroscopy Vacuum Permalloy Magnets WS2 Microchannel PinpointNanomechanicalMode BismuthVanadate Molybdenum NUS PolyvinylAcetate CancerCell Piezo blended polymers optoelectronics NiFe pulsed_laser_deposition Annealing Tin sulfide doped Hexacontane FailureAnalysis Treatment Dimethicone MechanicalProperty India Reduction Phase AtomicLayer Pinpoint PFM Mechanical&nanotechnology TPU ElectrostaticForceMicroscopy
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
ExFoliated graphene on SiO₂/Si wafer
Scanning Conditions
- System : FX40
- Scan Mode: Non-Contact, Lithography
- Scan Rate : 1 Hz
- Scan Size : 10μm×10μm
- Pixel Size : 256×256
- Cantilever : PPP-EFM (k=2.8N/m, f=75kHz)
- Litho. Condition : Force 200nN, Writing speed 0.2 μm/s , AC bias 10 V @ 40 kHz, Humidity ~90% RH