-
C_AFM SurfaceOxidation Pinpoint TungstenDeposition SKKU EvatecAG atomic_layer Resistance Polypropylene Yeditepe Polystyrene Singapore MoS2 hetero_structure self_healing BismuthFerrite AtomicSteps SAM SurfaceChange ThermalProperties Mechanical&nanotechnology Optoelectronic Polyimide multi_layer Tungsten GlassTemp Solution Sic OpticalWaveguides STO NtuEee Copper Zagreb Array Grain
Report image
If you found this image unacceptable, please let us know. We will review your report and take action if we determine this image is really unacceptable.
Pattern in Microchannel
Patterns are used to reduce liquid flow speed in microchannel.
Scanning Conditions
- System: NX10
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm, 5μm×5μm
- Scan Rate:1Hz, 0.5Hz
- Pixel: 512×256, 512×256
- Scan Mode: Non-contact
- Cantilever: AC160TS (k=26N/m, f=300kHz)
- Scan Size: 3μm×3μm, 5μm×5μm
- Scan Rate:1Hz, 0.5Hz
- Pixel: 512×256, 512×256