An innovative 3D metrology solution
Undercut and Overhang Profiling
The NX-3DM allows unique access to the undercut and overhang structures of photoresist and other industrial materials, ensuring users receive accurate topographical data throughout the entire sample.
Read More related application.Critical Dimension Measurement
True Non-contact mode enables instrument and subject-preserving CD measurement without sacrificing image fidelity.
Read More related application.
Sidewall Roughness Measurement
The NX-3DM’s innovative head tilting design allows access to the sidewalls using an ultra sharp tip to obtain high resolution, well-defined details of the area and its roughness. Innovative head tilting design allows access to the sidewalls using ultra sharp tip to obtain high resolution and(more defined)details of the side wall roughness.
Read More related applicationPark 3DM features
Innovative Z-Scan System
The many unique features of the NX-3DM are made possible by independently tilting the Z-scanner in its patented Crosstalk Eliminated platform, where XY and Z scanners are completely decoupled. This design allows users to access the vertical sidewalls as well as theundercut structures at various angles. Unlike in systems with flared tips, here high resolution and high aspect ratio probes can be used.
Flexure-Guided XY Scanner with Closed-loop Dual Servo System
The 100 μm x 100 μm XY scanner consists of a symmetrical 2-dimensional flexure stage and high-force piezoelectric stacks that provide highly orthogonal movement with minimal out-of-plane motion, as well as the high responsiveness essential for precise sample scanning at the nanometer scale. Two symmetric, low-noise sensors are present on each axis of the XY scanner to retain a high level of orthogonality in the context of large scanning ranges and sample sizes. The secondary sensor corrects and compensates for non-linear and non-planar positional errors which might occur using a single sensor alone.
Automatic Measurement Control for Increased Efficiency
The NX-3DM is equipped with automated software that makes operation seamless. Just select the desired measurement program to get precise multi-site analysis and auto-optimized settings for cantilever tuning, scan rate, gain, and set-point parameters. Park's user-friendly software interface gives you the flexibility to create customized operation routines so you can make the most of the NX-3DM with the least amount of effort. Creating new routines is easy. On average it takes only 10 minutes to make a new routine, and less than 5 to modify an existing one.
Industry Leading Low Noise Z Detector
Our AFMs are equipped with the most effective low noise Z detectors in the field, with a noise of 0.2 Å over large bandwidth. This produces highly accurate sample topography, no edge overshoot and no need for calibration. Just one of the many ways Park NX-3DM saves you time and gives you better data.
Accurate Sample Topography Measured by Low Noise Z Detector
No artifact by AFM scanner in low noise closed-loop topography
• Uses low noise Z detector signal for topography
• Has low Z detector noise of 0.02 nm over large bandwidth
• Has no edge overshoot at the leading and trailing edges
• Needs calibration done only once at the factory
Industry’s Lowest Noise Floor
To detect the smallest sample features, and image the flattest surfaces, Park has engineered the industry’s lowest noise floor specification of < 0.5 Å. The noise floor data is determined using a “zero scan.” The system noise is measured with the cantilever in contact with the sample surface at a single point under the following conditions:
Gauge Repeatability and Reproducibility
Due to the ever-decreasing size of components, manufacturers now require the highest level of quality control. Park AFM can provide 1 gauge sigma of less than 1 angstrom.
Tool-to-tool Correlation
Thanks to Park's revolutionary AFM platform designed for industrial metrology, Park NX-3DM will correlate with any existing Park AFMs that have been previously used for manufacturing, inspection, analysis, or research.